Physical Vapor Deposition (PVD)

What's PVD?

When using vacuum chamber technology, a process known as physical vapour deposition (PVD) turns solid or liquid materials into vapour that consists of gas-phase atoms, molecules or ions. Using low-pressure gas (or plasma) treatment, they are deposited on the substrate to make a thin film that has certain features.

Besides metal and alloy films, PVD deposition can also produce compound, ceramic, semiconductor and polymer films. It means applying a highly sophisticated form of surface treatment.

PVD technology is mainly used in ZCmould’s production of plastic moulds, die-casting moulds and CNC prototypes with the help of its partners.

Industry Applications

Advantages of Anodizing for Your Product

High Hardness

Nickel coating: 180HV Aluminum: 100HV Anodizing: 300HV Chrome plating: 800HV PVD: 1600HV

Aesthetic Appeal

They are fade resistant, have a smooth look, maintain one colour, come in many shades and reflect light.

Excellent Adhesion

PVD-coating is stronger than electroplating and spraying because bent PVD-coated parts do not crack or peel.

Durable Surface

They are not prone to either peeling or cracking; rather, they are much more enduring against being scratched; they are acid resistant, oxidation resistant and corrosion resistant.

Environmentally Friendly

Although its gases must be filtered, this production process can still be described as green manufacturing.

Physical Vapor Deposition Price

PVD Process Description Price
Ion Plating
Uses a high-energy ion beam to deposit material onto the substrate, often used for hard coatings.
$$
E-beam Evaporation
An electron beam is used to heat the material, causing it to vaporize and then deposit onto the substrate.
$$
Ion Beam Assisted Deposition (IBAD)
Uses an ion beam to assist deposition, enhancing film adhesion and density.
$$
Sputtering
Uses an ion beam to bombard the material, causing it to sputter and form a thin film on the substrate.
$
Arc PVD
Uses arc discharge to form a dense film on the substrate, often for decorative and functional coatings.
$$
Chemical Vapor Deposition (CVD)
Uses chemical reactions to deposit a film on the substrate, often for semiconductor and optical applications.
$$$
Evaporation
Uses heating to vaporize the material, which then deposits onto the substrate forming a thin film.
$
Plasma Enhanced Chemical Vapor Deposition (PECVD)
Uses plasma to enhance the chemical vapor deposition process, improving film quality.
$$$
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